To get from the desired 3D geometry to the actual nano-printed structure is no trivial task. A pattern file needs to be generated from the 3D geometry description (typically some sort of CAD file) that steers the electron beam accordingly. The process of generating such a pattern file holds some resemblance with the slicing operation known from 3D printing of plastic models.

Several process specific phenomena, such as precursor dynamics and the non-local nature of the electron exposure, have to be taken into account, so that the pattern file generation by slicing is challenging. We provide a compiled C++ implementation of a slicer or pattern generator that is able to handle wireframe-like 3D geometries in a semi-automatic fashion. If you are interested in the software, write us an e-mail. It is available for noncommercial usage. Implementation details and usage are described in the publication Pattern generation for direct-write three-dimensional nanoscale structures via focused electron beam induced deposition.